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US 4,726,877 AGranted
Methods of using photosensitive compositions containing microgels
AssigneeE. I. Du Pont de Nemours and Company
InventorsMichael Fryd, Terry R. Suess
Life of this patent
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Abstract
A solid photopolymerizable composition, contains addition polymerizable ethylenically unsaturated monomer, initiating system, polymer binder and a microgel wherein preferably the binder and microgel form substantially a single phase and have a similar glass transition temperature above 25.degree. C. Although less preferred the solid composition can function without the binder. A preferred use is as a photoresist.
Claims16
In a process for laminating a photosensitive film to a substrate comprising the steps of
- (a) laminating to the substrate a supported solid photosensitive film,
- (b) imagewise exposing the layer to actinic radiation,
- (c) removing unexposed areas of the layer to form resist areas,
- (d) permanently modifying areas of the substrate which are unprotected by the resist areas by etching the substrate or by depositing a material onto the substrate, and
- wherein the improvement comprises the photosensitive film which contains
- (a) addition polymerizable ethylenically unsaturated monomer,
- (b) initiating system activated by actinic radiation,
- (c) preformed macromolecular polymer binder, and
- (d) microgel,
- wherein the photosensitive composition is a solid and wherein at least one of the following is present:
- (i) the polymer binder and microgel form substantially one phase as viewed by the naked eye, or
- (ii) the polymer binder and microgel have glass transition temperatures which do not differ by more than 50.degree. C. with the microgel having a glass transition temperature above 25.degree. C.
9 more elements
In a process for laminating a photosensitive film to a substrate comprising
- (a) laminating to the substrate a supported solid photosensitive film,
- (b) imagewise exposing the layer to actinic radiation,
- (c) removing unexposed areas of the layer to form resist areas,
- (d) permanently modifying areas of the substrate which are unprotected by the resist areas by etching the substrate or by depositing a material onto the substrate, and
- wherein the improvement comprises the photosensitive film which contains
- (a) addition polymerizable ethylenically unsaturated monomer,
- (b) initiating system activated by actinic radiation, and
- (c) microgel,
- wherein the photosensitive composition is a solid with the proviso that the photosensitive composition is substantially free of any preformed macromolecular polymer binder.
6 more elements
Dependencies are inferred from the claim text.