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US 4,726,320 AGranted
Laser CVD device
AssigneeFuji Electric Co., Ltd.
InventorYukimi Ichikawa
Life of this patent
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Abstract
In a laser CVD device, immediately before being emitted from a nozzle, raw gas in a reaction chamber reacts opto-chemically with a focused laser beam so that it is decomposed to form a radical flow. The radical flow flows against a substrate set in the reaction chamber so that active materials produced by the optochemical decomposition accumulate on the substrate to form a thin film thereon.
Claims7
A laser CVD device comprising:
- a reaction chamber;
- a substrate supporting member provided in said reaction chamber;
- a raw gas introducing pipe extending into said reaction chamber and having a nozzle connected thereto with an orifice at one end for emitting a flow of raw gas towards said substrate supporting member;
- a laser beam source provided outside said reaction chamber;
- and
- an optical system for focusing a laser beam from said laser beam source on said one end of the nozzle for irradiating substantially all of the raw gas emitted into the reaction chamber through said orifice from said nozzle.
3 more elements
Dependencies are inferred from the claim text.