Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound

A positive-working photoresist composition which comprises a solvent and solid ingredients dissolved therein;

• said solids, whose proportions are based by weight on the total solids in said composition, comprise:
• (a) from about 63 to about 68 percent of a novolak resin;
• (b) from about 15 to about 22 percent of a naphthoquinone diazide sensitizer prepared by mono-, di- or tri-esterifying a low molecular weight phenol compound with 1,2-naphthoquinone-2-diazide-5-chloride, said phenol compound having the formula ##STR5## wherein:
• R is a single bond or one of the groups CO, S, O, SO.sub.2 or CR.sub.6 R.sub.7 ;
• R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently H, X (where X is a halogen atom), OH, a lower alkyl group having 1 to 4 carbon atoms or a lower alkoxy group having 1 to 4 carbon atoms;
• and
• R.sub.6 and R.sub.7 are each independently H or a lower alkyl group having 1 to 4 carbon atoms;
• or wherein:
• two of the radicals R.sub.3, R.sub.4 and R.sub.5 or the two radicals R.sub.1 and R.sub.2 independently jointly form an aromatic ring, whereby at least one of the radicals R.sub.1, R.sub.2, R.sub.3, R.sub.4 or R.sub.5 is OH;
• (c) from about 0.1 to about 3 percent of a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm;
• and
• (d) an effective proportion of an additive compound to increase the photospeed and rate of development of said composition, said additive compound being a trihydroxybenzophenone compound and said proportion ranging from about 10 to about 20 percent.