US 4,613,402 A · Method of making edge-aligned implants and electrodes therefor

Abstract

There is disclosed a process particularly suited for making CCD's. The process comprises the steps of (a) depositing a layer of conductive material above a semiconductor substrate; (b) forming a patterned mask above the conductive layer, the pattern exposing spaced-apart strip portions of the conductive layer; (c) ion-implanting dopant strips into the substrate through the conductive layer strip portions exposed by the patterned mask; (d) removing a portion of the mask but retaining the rest so as to expose the conductive layer over first portions of the substrate that contain an implanted dopant strip and over portions of the substrate adjacent to the first portions; (e) forming on the conductive layer between the retained mask portions, and above the implanted dopant strips, strips of a material resistant to an etchant for the conductive material; (f) removing the retained mask portions; and (g) etching away the conductive layer where the latter is not covered with the etchant-resistant material so as to leave conductive strips overlying the implanted strips.

Claims12

Dependent claims

A method for accurately aligning strips of implanted dopant in a semiconductor substrate with conductive strips above the implant strips, comprising the steps of

(a) depositing a layer of conductive material above said semiconductor substrate;
(b) forming a patterned mask above said layer, the pattern exposing spaced-apart first strip portions of said conductive layer;
(c) ion-implanting said dopant strips into said substrate through the conductive layer strip portions exposed by said patterned mask;
(d) removing a portion of said mask but retaining the rest so as to expose said conductive layer over first portions of said substrate that contain an implanted dopant strip and over portions of said substrate adjacent to said first portions;
(e) forming on said conductive layer between said retained mask portions, second strips of a material or of a thickness effective, when carrying out steps (f) and (g), to leave behind said second strips;
(f) removing said retained mask portions;
and
(g) etching away said conductive layer where the latter is not covered with said second strips.

5 more elements

Dependencies are inferred from the claim text.

Method of making edge-aligned implants and electrodes therefor

Life of this patent

Method of making edge-aligned implants and electrodes therefor

Life of this patent

Abstract

Claims12