US 4,595,601 A · Method of selectively forming an insulation layer

Abstract

An insulation layer is selectively formed by exposing the surface of a workpiece to an atmosphere comprising a mixture of a halogen-based gas and a raw gas containing a compoundable element chemically bondable with an element of a material constituting surface layer of the workpiece to form an insulating compound. The surface layer of the workpiece is formed of a non-insulating material, such as a metallic material or a semiconductor material. Light rays are directly irradiated on the selected region or regions of the surface of the workpiece through the atmosphere of the gaseous mixture, thereby dissociating said halogen-based gas. As a result, a layer comprising the insulating compound is formed on the selected region of the surface of the workpiece on which the light rays have been directly irradiated.

Claims20

Dependent claims

A method of selectively forming an insulation layer which comprises the steps of:

exposing a workpiece whose surface layer comprises a non-insulating material to an atmosphere comprising a gaseous mixture of a halogen-based gas and a raw material gas containing an element chemically bondable with an element of said non-insulating material to form an insulating compound;
directly irradiating a light ray on a selected surface region of the workpiece through said atmosphere while heating said workpiece to a prescribed temperature, thereby dissociating said halogen-based gas;
and
forming a layer comprising said insulating compound on said selected surface region of said workpiece on which said light ray has been directly irradiated.

1 more element

Dependencies are inferred from the claim text.

Method of selectively forming an insulation layer

Life of this patent

Method of selectively forming an insulation layer

Life of this patent

Abstract

Claims20