Method of and apparatus for coating shaped parts by cathodic atomization
AssigneeLeybold-Heraeus GmbH
InventorsWolf D. Munz, Gerhard Hessberger
Life of this patent
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Abstract
An apparatus for and method of coating a three-dimensional shaped-part surface by the cathodic atomization of target material from two, facing, magnetically-concentrating cathodic atomization devices applies a voltage, which is negative with respect to ground and of such magnitude that touching of the plasma clouds from the devices is facilitated to the shaped part.
Claims11
A method of coating a part by cathodic atomication of target material, the part having a three-dimensional surface to be coated, comprising:
- providing two, facing cathodic atomization devices for receiving the part to be coated in a discharge space therebetween, each cathodic atomization device having a target of the same material with a surface delimiting the discharge space, a cathode arrangement for producing a plasma cloud of the target material in the discharge space, and magnetic means producing a magnetic field which closes on the target for concentrating the plasma cloud of the target material in a zone at the target surface delimiting the discharge space;
- and
- applying a voltage which is negative with respect to ground to the part to be coated in the discharge space sufficient to facilitate at least touching of the plasma clouds of the target material from the cathodic atomization devices at the part to be coated in the discharge space.
Apparatus of coating a part by cathodic atomization of target material, the part having a three-dimensional surface to be coated, comprising:
- two, facing cathodic atomization devices for receiving the part to be coated in a discharge space therebetween, each cathodic atomization device having a target of the same material with a surface delimiting the discharge space, a cathode arrangement for producing a plasma cloud of the target material in the discharge space, and magnetic means producing a magnetic field which closes on the target for concentrating the plasma cloud of the target material in a zone at the target surface delimiting the discharge space;
- and
- means for applying a voltage which is negative with respect to ground to the part to be coated in the discharge space sufficient to facilitate at least touching of the plasma clouds of the target material from the cathodic atomization devices at the place in the discharge space where the part to be coated will be received.
Dependencies are inferred from the claim text.