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US 4,539,695 AGranted
X-Ray lithography system
AssigneeThe Perkin-Elmer Corporation
InventorCarlo La Fiandra
Life of this patent
Estimating the term…
Abstract
The present invention is directed to X-ray lithographic systems, which are characterized by a plurality of work stations, a cartridge in which a wafer and mask are mounted, apparatus for moving the cartridge between the stations, apparatus for moving the cartridge within each station to a kinematic mount, and said kinematic mounts in all of the stations being substantially identical.
Claims2
A method of treating a mask and wafer in an X-ray lithographic system comprising the steps of:
- mounting a wafer on a cartridge at a load station;
- moving said cartridge upwardly to a kinematic mount in said load station;
- adjusting in co-operation with an air gauge in said load station the tilt in two directions of said wafer and its proximity with respect to a mask position in said cartridge;
- lowering said cartridge to its travel position;
- moving said cartridge on its air feet to an alignment station;
- mounting a mask on said cartridge;
- moving said cartridge upwardly to a kinematic mount in said alignment station;
- adjusting the lateral alignment in the X and Y direction and the rotational alignment about a vertical axis of said wafer with respect to said mask;
- lowering said cartridge to its traveling position with the mask retained;
- moving said cartridge on its air feet to an X-ray exposure station;
- moving said cartridge upwardly to a kinematic mount in said exposure station;
- purging the area with helium gas;
- and
- exposing said wafer with X-rays.
11 more elements
Dependencies are inferred from the claim text.