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US 4,539,285 AGranted
Photosensitive negative diazo composition with two acrylic polymers for photolithography
AssigneeAmerican Hoechst Corporation
InventorsTulay Duyal, John E. Walls
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Abstract
An improved resin coated substrate is prepared by coating a suitable substrate, such as aluminum with a composition comprising a salt having the structure A-N.sub.2.sup.+ X.sup.- wherein A is an aromatic or heterocyclic residue and X is an anion of an acid; and a binder composition comprising both an acrylic polymer and an acid containing acrylic copolymer.
Claims18
A photosensitive composition which comprises in admixture:
- (a) from about 15% to about 45% by weight of a light sensitive, negative working diazonium salt;
- and
- (b) from about 15% to about 45% by weight of an acrylic polymer having the formula ##STR3## wherein R.sub.1 is H or, CH.sub.3
- R.sub.2 is CH.sub.3, CH.sub.2 CH.sub.3, or (CH.sub.2).sub.3 CH.sub.3
- R.sub.3 is CH.sub.3, CH.sub.2 CH.sub.3, or (CH.sub.2).sub.3 CH.sub.3
- m=1 when R.sub.2 is equal to R.sub.3, and
- n=1 when m=1, or
- m=1 to 4 when R.sub.2 is not equal to R.sub.3, and
- n=1 to 4 when m=1 to 4
- x=300 to 500 when R.sub.2 is equal to R.sub.3
- x=200 to 400 when R.sub.2 is not equal to R.sub.3
- said acrylic polymer having an average molecular weight in the range of from about 35,000 to about 410,000;
- and
- (c) from about 20% to about 50% by weight of an acid containing acrylic copolymer having the formula ##STR4## wherein:
- R.sub.4 is H or, CH.sub.3
- R.sub.5 is CH.sub.3, CH.sub.2 CH.sub.3 or, (CH.sub.2).sub.3 CH.sub.3
- o is equal to 4 to 12, and
- p is equal to 1, and
- y is equal to 350 to 800
- said copolymer having an average molecular weight in the range of from about 140,000 to about 1,450,000.
17 more elements
Dependencies are inferred from the claim text.