Mask structure for X-ray lithography and method for making same
AssigneeEaton Corporation
InventorsBob J. Williams, Daniel L. Brors
Life of this patent
Estimating the term…
Abstract
A mask substrate for use in X-ray lithography formed of a composite, X-ray transparent member which is stretched over a fixture to a predetermined tension and then adhered to a borosilicate glass ring. In accordance with a preferred embodiment, the composite member includes a film of polyborane which has been grown in compression, onto which a polyimide is coated. The polyborane film is grown on a silicon wafer, coated with the polyimide, after which the central area of the wafer is etched away. The borosilicate glass is adhered to the polyimide side of the composite, leaving the tensioned polyborane surface open for the application of an X-ray absorptive pattern thereto to define a complete mask structure suitable for use in X-ray lithography.
Claims23
A method for forming a mask substrate for X-ray lithography comprising the steps of:
- a. forming a film of a first X-ray transparent material on a support member;
- b. coating said film with a layer of a second X-ray transparent material;
- c. etching away the central area of said support member, leaving a composite X-ray transparent member adhered to a first ring;
- d. placing said composite member on a second ring with the first X-ray transparent material in contact therewith, said second ring having an outer diameter somewhat smaller than the inner diameter of said first ring;
- e. applying a predetermined force to the edge of said composite member extending beyond the outer diameter of said second ring to put said composite member in tension;
- f. while said predetermined force is being applied, adhering a third ring to said layer of said second X-ray transparent material;
- g. removing the force applied in step (e);
- and
- h. trimming away any of said composite member and said first ring extending beyond the outer diameter of said second ring.
A method for forming a mask structure for X-ray lithography comprising the steps of:
- a. forming a film of a first X-ray transparent material on a support member;
- b. coating said film with a layer of a second X-ray transparent material;
- c. etching away the central area of said support member, leaving a composite X-ray transparent member adhered to a first ring;
- d. placing said composite member on a second ring with the first X ray transparent material in contact therewith, said second ring having an outer diameter somewhat smaller than the inner diameter of said first ring;
- e. applying a predetermined force to the edge of said composite member extending beyond the outer diameter of said second ring to put said composite member in tension;
- f. while said predetermined force is being applied, adhering a third ring to said layer of said second X-ray transparent material;
- g. removing the force applied in step (e);
- h. trimming away any of said composite member and said first ring extending beyond the outer diameter of said second ring;
- and
- i. depositing a pattern of an X-ray absorptive material to the open surface of said first X-ray transparent material.
A mask structure for X-ray lithography comprising a compressive inorganic X-ray transparent member, a polymeric X-ray transparent layer deposited on said compressive inorganic member, said inorganic member and said polymeric layer being mechanically tensioned to define a tensile composite substrate for supporting an X-ray absorptive pattern on the free surface of said inorganic member, and a support ring adhered to said polymeric layer.
A mask structure for X-ray lithography comprising a compressive inorganic X-ray transparent member, a polymeric X-ray transparent layer deposited on said compressive inorganic member, said inorganic member and said polymeric layer being mechanically tensioned to define a tensile composite substrate, a support ring adhered to said polymeric layer, and an X-ray absorptive pattern deposited on said inorganic member.
A mask substrate for X-ray lithography;
- said substrate being formed by a process comprising forming a film of an inorganic X-ray transparent material, coating said film with a layer of a polymeric X ray transparent material to define a composite X-ray transparent member, applying a predetermined tensile force to said composite member, and adhering a support ring to said polymeric layer to define a tensile composite substrate having a free surface of said inorganic X-ray transparent film available for the deposition of an X-ray absorptive pattern thereon.
A mask structure for X-ray lithography;
- said mask structure being formed by a process comprising forming a film of an inorganic X-ray transparent material, coating said film with a layer of a polymeric X-ray transparent material to define a composite X-ray transparent member, applying a predetermined tensile force to said composite member, adhering a support ring to said polymeric layer, and depositing a pattern of an X-ray absorptive material on the inorganic film.
Dependencies are inferred from the claim text.