US 4,537,501 A · Apparatus for the attitude control of plate-form body

Abstract

An apparatus for the attitude control of a plate-form body such as mask or wafer comprises a supporting table, a first movable stage placed on the table and a second movable stage placed on the first stage. The second movable stage is provided means for holding the plate-form body on a reference plane containing the origin of the coordinates defined by two orthogonal coordinate axes. Between the supporting table and the first movable stage there is disposed first driving means. The first driving means is disposed for displacing the first movable stage at at least two positions opposed to each other relative to one of the coordinate axes. The displacement is produced in the direction substantially normal to a segment passing through the origin of the coordinates and forming a determined angle with the reference plane. The displacement of the first stage relative to the table in the direction substantially normal to the above direction is inhibited by first limiting means. Similarly second driving means is disposed between the first and second movable stages for producing the displacement of the second stage at at least two positions opposed to each other relative to the other coordinate axis. The displacement produced by second driving means is in the direction substantially normal to a segment passing through the origin of the coordinates and forming a determined angle with the reference plane. Second limiting means is provided to inhibit the displacement of the second movable stage in the direction substantially normal to the above direction of displacement by the second driving means.

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Claims10

Dependent claims

Apparatus for the attitude control of a plate-form body placed on a reference plane comprising:

(a) support table means;
(b) at least two first spring members arranged on said support table means at different positions including two positions opposed to each other relative to one of the axes of rectangular coordinates on said reference plane;
(c) first movable stage means placed on said support table means through said first spring members;
(d) first driving means for producing a displacement of said first movable stage means at different positions including two positions opposed to each other relative to said one coordinate axis and in the direction tangent to a circle described normally to said one coordinate axis with the center of the circle being on said one coordinates axis;
(e) at least two second spring members arranged on said first movable stage means at different positions including two positions opposed to each other relative to the other axis of said rectangular coordinates;
(f) second movable stage means placed on said first movable stage means through said second spring members, said second stage means including means for holding said plate-form body on said reference plane containing the origin of said rectangular coordinates;
and
(g) second driving means for producing a displacement of said second movable stage means at different positions including two opposed positions relative to the other coordinate axis and in the direction tangent to a circle described normally to the other coordinate axis with the center of the circle being on the other coordinate axis.

5 more elements

Apparatus for the attitude control of a plate-form body placed on a reference plane comprising:

(a) support table means having a pair of opposed inclined surfaces formed along two different planes containing one of the axes of rectangular coordinates on said reference plane and forming a determined angle with said reference plane;
(b) a pair of first spring members placed on said pair of inclined surfaces respectively and being deformable in the direction normal to said inclined surfaces;
(c) first movable stage means having a pair of opposed inclined surfaces formed along two different planes containing the other axis of said rectangular coordinates, said first movable stage means being placed on said support table means through said first spring members;
(d) a pair of second spring members placed on said pair of inclined surfaces of said first movable stage means respectively and being deformable in the direction normal to said inclined surfaces;
(e) second movable stage means placed on said first movable stage means through said second spring members, said second movable stage means including means for holding said plate-form body on said reference plane containing the origin of said rectangular coordinates;
(f) first driving means disposed between the respective inclined surfaces of said support table means and said first movable stage means and including a pair of operation members for displacement in the direction normal to said respective inclined surfaces;
and
(g) second driving means disposed between the respective inclined surfaces of said first movable stage means and said second movable stage means and including a pair of operation members for displacement in the direction normal to said respective inclined surfaces.

5 more elements

Apparatus for the attitude control of a plate-form body placed on a reference plane comprising:

(a) support table means having a first pair of opposed inclined surfaces formed along two different planes containing one of the axes of rectangular coordinates on said reference plane and forming a determined angle with said reference plane;
(b) first movable stage means disposed on said first pair of inclined surface with a space between said first stage means and said support table means, said first movable stage means having a second pair of opposed inclined surfaces formed along two different planes containing the other axis of said rectangular coordinates and forming a determined angle with said reference plane;
(c) second movable stage means disposed on said second pair of inclined surfaces with a space between said first stage means and said second stage means, said second movable stage means including means for holding said plate-form body on said reference plane containing the origin of said rectangular coordinates;
(d) first limiting means disposed between said first pair of inclined surfaces and said first movable stage means for inhibiting the displacement of said first movable stage means in the direction along said inclined surfaces;
(e) second limiting means disposed between said second pair of inclined surfaces and said second movable stage means for inhibiting the displacement of said second movable stage means in the direction along said inclined surfaces;
(f) first driving means including operation members for displacing a plural number of determined positions of said first movable stage means opposed to the respective ones of said first pair of inclined surfaces in the direction normal to said respective inclined surfaces;
and
(g) second driving means including operation members for displacing a plural number of determined positions of said second movable stage means opposed to the respective ones of said second pair of inclined surfaces in the direction normal to said respective inclined surfaces.

5 more elements

In an exposure apparatus for projecting a beam of light on the surface of a semiconductor substrate through a photo mask disposed proximately to said substrate, apparatus for controlling the attitude of the reference plane of said photo mask relative to said substrate surface comprising:

(a) support table means having a first pair of opposed inclined surfaces formed along two different planes containing one of the axes of the rectangular coordinates on said reference plane and forming a determined angle with said reference plane;
(b) first movable stage means disposed on said first pair of inclined surfaces with a space between said stage means and said table means, said first movable stage means having a second pair of opposed inclined surfaces formed along two different planes containing the other coordinate axis and forming a determined angle with said reference plane;
(c) second movable stage means disposed on said second pair of inclined surfaces with a space between said first movable stage means and said second movable stage means, said second movable stage means including means for holding said photo mask on said reference plane containing the origin of said rectangular coordinates;
(d) first limiting means disposed between said first pair of inclined surfaces and said first movable stage means for inhibiting the displacement of said first stage means in the direction along said first pair of inclined surfaces;
(e) second limiting means disposed between said second pair of inclined surfaces and said second movable stage means for inhibiting the displacement of said second movable stage means in the direction along said second pair of inclined surfaces;
(f) first driving means including a pair of operation members disposed between said first movable stage means and the respective ones of said first pair of inclined surfaces for displacement in the direction normal to said respective inclined surfaces;
and
(g) second driving means including a pair of operation members disposed between said second movable stage means and the respective ones of said second pair of inclined surfaces for displacement in the direction normal to said respective inclined surfaces.

5 more elements

Dependencies are inferred from the claim text.

Description3,171 words

Summary810 words

#1. Field of the Invention

#The present invention relates to apparatus for the attitude control of a plate-form body. More particularly, the present invention relates to the attitude control apparatus of wafer or mask used for the precision alignment of a photo mask with a semiconductor substrate surface in making semiconductor elements.

#2. Description of the Prior Art

Brief description of the drawings8 figures

#FIG. 1 is a schematical view of an X-ray exposure apparatus showing an embodiment of the present invention;

#FIG. 2 is a plan view of the attitude control apparatus of the embodiment;

#FIG. 3 is a sectional view taken along the line III--III and looking in the direction of arrow in FIG. 2;

Detailed description2,214 words

#Referring first to FIG. 1 there is shown an X-ray exposure apparatus in which the present invention has been embodied.

#The exposure apparatus includes an electron gun 2 and a target 4 enclosed in a vacuum chamber 6. The electron gun 2 emits soft X-rays which come out of the chamber 6 through a window 8 and then run in the air toward a photo mask 10. The photo mask has a pattern formed thereon. An image of the pattern is printed on the surface of a wafer 12 by the soft X-rays.

#The wafer 12 is placed on a wafer stage 14 which is movable in the directions of X, Y, Z and .theta. for the alignment of the wafer with the photo mask. 20 is an attitude control apparatus with a mask holder which holds the photo mask 10 by suction. The apparatus 20 controls the attitude of the mask in order to keep the mask parallel to the wafer. The detailed structure of the attitude control apparatus 20 is shown in FIGS. 2 to 6.

Apparatus for the attitude control of plate-form body

Life of this patent

Apparatus for the attitude control of plate-form body

Life of this patent

Life of this patent

Abstract

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Claims10

Description3,171 words

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Classification2 codes

Life of this patent

Description3,171 words