Method for forming tapered films
AssigneeHitachi, Ltd.
InventorsHitoshi Kubota, Minoru Tanaka, Susumu Aiuchi
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Abstract
Method for forming thin films on a substrate by using a mask through dry process wherein the substrate and the mask are moved relative to each other at least once for the formation of a thin film before the thickness of the thin film being formed on the substrate reaches a predetermined value, so that the formed thin film has an outer edge partly or entirely contoured stepwise.
Claims14
A method for producing multiple layers, including a tapered thin film as a lower layer thereof, on a substrate by dry process comprising:
- using a mask having a pattern with a smaller dimension by a pattern difference than a desired pattern of the thin film, said pattern having the smaller dimension at least in the direction of the taper to be formed;
- carrying out a relative motion between said substrate and said mask disposed close to the substrate within the range of said desired pattern, in the direction of said taper to be formed;
- forming a thin film on said substrate by vapor deposition in association with said relative motion to thereby produce a substantially-tapered, vapor-deposited thin film;
- and
- forming at least one layer on said substantially-tapered, vapor-deposited thin film.
A method for forming multiple layers, including a thin film of a desired pattern as a lower layer on a substrate, by using a mask through dry process, comprising the steps of:
- placing said mask and said substrate with a predetermined distance therebetween in opposed relation with each other, said mask having an aperture pattern smaller by a pattern difference (w) than at least one dimension of said desired pattern of the thin film;
- effecting a first one of multiple depositions on the substrate through said mask;
- changing the relative position between the mask and the substrate, by a distance smaller than said pattern difference, in the direction of the at least one thin film pattern dimension, each time each of the multiple depositions is completed;
- effecting the succeeding one of said multiple depositions on the substrate, whereby the thin film, having a tapered edge in the direction of said thin film pattern dimension, is formed by said multiple depositions;
- and
- forming at least one layer on said thin film having a tapered edge.
Dependencies are inferred from the claim text.