Semiconductor printing apparatus with multiple independent temperature control
AssigneeCanon Kabushiki Kaisha
InventorKazuo Takahashi
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Abstract
A semiconductor printing apparatus eliminates the alignment error caused by any relative deformation between the mask and the wafer due to variations in parameters such as temperature change, and intermediate processing, for example, etching etc. The apparatus is characterized by the provision of a device for cooling or heating respectively and independently plural different sections of at least either of the mask and the wafer.
Claims9
A semiconductor printing apparatus capable of compensating for any relative local variation in size between a mask and a wafer in the planes of the mask and the wafer, said printing apparatus comprising:
- means for holding a mask;
- means for holding a wafer;
- and
- means for locally adjusting the temperature of at least one of the mask and the wafer thereby compensating for the local variation in size in the planes of the mask and the wafer between the mask and wafer.
A semiconductor printing apparatus capable of compensating for any local variation in size between a mask and a wafer in the planes of the mask and the wafer, said printing apparatus comprising:
- means for detecting the temperature in a local area of at least one of the mask and the wafer;
- means for locally adjusting the temperature of at least one of the mask and the wafer thereby to compensate for the local variation in size of at least one of the mask and the wafer in the planes of the mask and the wafer;
- and
- means for controlling said temperature adjusting means according to the difference in temperature distribution between the mask and the wafer detected by said temperature detection means.
Dependencies are inferred from the claim text.