Deposition of diamondlike carbon films
AssigneeThe United States of America as represented by the Administrator of the National Aeronautics and Space Administration
InventorsMichael J. Mirtich, James S. Sovey, Bruce A. Banks
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Abstract
A diamondlike carbon film is deposited in the surface of a substrate by exposing the surface to an argon ion beam containing a hydrocarbon. The current density in the ion beam is low during initial deposition of the film. Subsequent to this initial low current condition, the ion beam is increased to full power. At the same time a second argon ion beam is directed toward the surface of the substrate. The second ion beam has an energy level much greater than that of the ion beam containing the hydrocarbon. This addition of energy to the system increases mobility of the condensing atoms and serves to remove lesser bound atoms.
Claims19
A method of making diamondlike carbon films on a substrate comprising the steps of
- exposing said substrate to a first ion beam having a first current density and a first energy level,
- introducing a hydrocarbon into said first ion beam whereby an initial portion of a diamondlike carbon film is deposited on said substrate,
- increasing the current density of said first ion beam to a second current density whereby a remaining portion of a diamondlike carbon film is deposited on said substrate, and
- exposing said substrate to a second ion beam having a second energy level greater than said first energy level during the deposition of said remaining portion of said diamondlike carbon film.
A method of depositing a diamondlike carbon film on a substrate surface comprising the steps of
- mounting the substrate in a vacuum environment,
- directing a first ion beam containing a hydrocarbon toward said surface, and
- directing a second ion beam having an energy level greater than that of said first ion beam toward said surface.
Dependencies are inferred from the claim text.