Method of operating a semiconductor memory circuit
AssigneeTokyo Shibaura Denki Kabushiki Kaisha
InventorHisakazu Iizuka
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Shibaura Denki Kabushiki Kaisha
InventorHisakazu Iizuka
Estimating the term…
Disclosed is a semiconductor memory element having a semiconductor substrate of P conductivity type, source and drain regions which are of N conductivity type and formed in the substrate, a first gate insulation layer formed on the major surface of the substrate, corresponding to a channel region located between the source and drain, a floating gate electrode formed on the first gate insulation layer so as to partially overlap the channel region, a second gate insulation layer formed on the floating gate electrode, a control gate electrode formed on the second gate insulation layer so as to partially overlap the floating gate electrode, and an addressing gate electrode formed on the control gate electrode, extending to a portion of the channel region not covered by the floating gate electrode and the control gate electrode.
A method of operating a semiconductor memory circuit comprising:
Dependencies are inferred from the claim text.