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US 4,440,811 AGranted
Method for coating and an apparatus for coating
AssigneeKonishiroku Photo Industry Co., Ltd.
InventorsYosatomi Hitaka, Takemasa Namiki
Life of this patent
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Abstract
An improved method of coating one or more layer of a coating liquid onto a moving substrate from a coating hopper wherein coating bead of the coating liquid is formed and a part of the bead is formed at a side of entering of the substrate with respect to an efflux end of the coating hopper, and an end of the part of the bead being in contact with the coating hopper is held at a fixed position.
Claims3
A method for reducing streak defects during the coating of one or more layers of a coating liquid onto a moving substrate from a coating hopper having a coating surface comprising the steps of:
- supplying a coating liquid from an efflux end of a coating hopper as a layer;
- forming a bead of the supplied coating liquid, said bead bridging the coating hopper and the substrate with part of said bead formed at an entering side of the substrate relative to the efflux end and an end of said bead at the entering side in contact with the hopper;
- holding said end of said bead at a liquid end-holding portion of a liquid puddle arranged on the coating hopper, said liquid end-holding portion being formed on said coating surface of the coating hopper by notching said coating surface, said notched coating surface containing an interfering surface substantially perpendicular to the flow of said layer of coating liquid, said interfering surface interfering with the flow of said layer of coating liquid;
- and
- moving the substrate in contact with the coating liquid so that the substrate is coated with the coating liquid.
2 more elements
Dependencies are inferred from the claim text.