Radiation sensitive polymer materials
AssigneeHitachi, Ltd.
InventorsKazuo Nate, Toshio Kobayashi, Tokio Isogai
Life of this patent
Estimating the term…
Abstract
A radiation sensitive polymer material having (a) one or more repeating units of the formula: ##STR1## wherein R is an alkyl group, a halogen atom, a hydrogen atom or a dimethylamino group, and (b) an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C< group in the molecule, can give a positive type resist having excellent resistance to dry etching and being highly sensitive to radiation.
Claims17
A radiation sensitive polymer material for producing a positive type resist having improved radiation sensitivity which consists essentially of
- (a) 10 to 100% by mole of one or more repeating units of the formula:
- ##STR17## wherein R is a hydrogen atom, a lower alkyl group, a lower alkoxy group, a halogen atom, or a dialkylamino group, and
- (b) 90 to 0% by mole of an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C<
- group in the molecule.
A radiation sensitive polymer material for producing a positive type resist having improved radiation sensitivity which consists essentially of
- (a) 10 to 100% by mole of one or more repeating units represented by the formula:
- ##STR21## wherein R is a hydrogen atom, a methyl group, a methoxy group, a chlorine atom, a bromine atom, an iodine atom or a dimethylamino group, and
- (b) 90 to 0% by mole of an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C<
- group in the molecule.
A radiation sensitive polymer material for producing a positive type resist having improved radiation sensitivity which consists essentially of
- (a) 20 to 100% by mole of one or more repeating units of the formula:
- ##STR23## wherein R is a lower alkyl group, a lower alkoxy group, a halogen atom, or a dialkylamino group, and
- (b) 80 to 0% by mole of an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C<
- group in the molecule.
Dependencies are inferred from the claim text.