Flux control device

In a flux control device including a vessel for containing a liquid flux, a first reservoir for storing a concentrated flux, a second reservoir for storing a diluent, means for checking the specific gravity and surface level of the liquid flux in the vessel for any deviations from predetermined ranges, and means for selectively feeding the concentrated flux and diluent to the vessel from the first and second reservoirs in such a manner as to maintain the specific gravity and the surface level of the liquid flux in the vessel within the predetermined ranges, the improvement comprising said feeding means which includes:

• a source of pressurized gas;
• first and second gas-liquid feed assemblies coupled to the first and second reservoirs, respectively, each feed assembly having an outer pipe and an inner pipe defining a liquid passage therein and placed inside of the outer pipe to define a gas passage therebetween, said gas passage having one end thereof in open communication with the upper space within said respective reservoir and the other end in communication with said pressurized gas source, and said liquid passage having one end thereof in communication with the liquid in said respective reservoir and the other end in communication with said vessel;
• means to removably mount each of the first and second gas-liquid feed assemblies on each of the first and second reservoirs, the mounting means including a first retaining element pivotally supported adjacent to an end portion of the outer pipe received within the reservoir, the retaining element pivotal about an axis substantially orthogonal to the longitudinal axis of the outer pipe, and a clamping member threadedly engaging the exterior surface of the outer pipe and adjustably movable along the outer pipe to clamp the first retaining member against the reservoir wall;
• and
• means for selectively communicating said gas passages of said first and second gas-liquid feed assemblies with said pressurized gas source so that the concentrated flux and the diluent may be fed to said vessel through respective liquid passages when said first and second reservoirs are selectively communicated with said pressurized gas source through respective gas passages.