Semiconductor memory device

A semiconductor memory device including a first MOS field effect transistor and a second MOS field effect transistor having a current path connected at one end to the gate electrode of the first MOS field effect transistor, the device comprising:

• a semiconductor substrate of a first conductivity type constituting the channel of either of said first MOS field effect transistor or said second MOS field effect transistor;
• a first polycrystalline semiconductor layer deposited on said semiconductor substrate;
• an oxide layer interposed between said first polycrystalline semiconductor layer and said semiconductor substrate, said first polycrystalline semiconductor layer forming the channel of the other of said first MOS field effect transistor and said second MOS field effect transistor;
• a first semiconductor region of a second conductivity type formed in the surface region of said semiconductor substrate below one end portion of said first polycrystalline semiconductor layer;
• second and third semiconductor regions of said second conductivity type formed in the surface region of said semiconductor substrate on opposite sides of the other end portion of said first polycrystalline semiconductor layer, said second and third semiconductor regions optionally constituting the drain and source regions of said first MOS field effect transistor, the other end portion of said first polycrystalline semiconductor layer functioning as the gate region of said first MOS field effect transistor, said one end portion of said first polycrystalline semiconductor layer forming the source and drain regions of said second MOS field effect transistor with said first semiconductor region interposed therebetween, and said first semiconductor region forming the gate region of said second MOS field effect transistor;
• a read word line connected to the source region of said first MOS field effect transistor;
• a read bit line connected to the drain region of said first MOS field effect transistor;
• a write word line connected to the gate region of said second MOS field effect transistor;
• and
• a write bit line connected to the drain region of said second MOS field effect transistor.

A semiconductor memory device including a first MOS field effect transistor and a second MOS field effect transistor having a current path connected at one end to the gate electrode of the first MOS field effect transistor, the device comprising:

• a semiconductor substrate of a first conductivity type constituting the channel of either of said first MOS field effect transistor or said second MOS field effect transistor;
• a first polycrystalline semiconductor layer deposited on said semiconductor substrate;
• an oxide layer interposed between said first polycrystalline semiconductor layer and said semiconductor substrate, said first polycrystalline semiconductor layer forming the channel of the other of said first MOS field effect transistor and said second MOS field effect transistor;
• a first semiconductor region of a second conductivity type formed in the surface region of said semiconductor substrate below one end portion of said first polycrystalline semiconductor layer;
• second and third semiconductor regions of said second conductivity type formed in the surface region of said semiconductor substrate on opposite sides of the other end portion of said first polycrystalline semiconductor layer, said second and third semiconductor regions optionally constituting the drain and source regions of said first MOS field effect transistor, the other end portion of said first polycrystalline semiconductor layer functioning as the gate region of said first MOS field effect transistor, said one end portion of said first polycrystalline semiconductor layer forming the source and drain regions of said second MOS field effect transistor with said first semiconductor region interposed therebetween, and said first semiconductor region forming the gate region of said second MOS field effect transistor;
• a read word line connected to the source region of said first MOS field effect transistor;
• a write word line connected to the gate region of said second MOS field effect transistor;
• and
• a bit line connected to the drain region of the first MOS field effect transistor and the drain region of said second MOS field effect transistor.

A semiconductor memory device including a plurality of matrix-arranged memory cells, each of said memory cells being provided with a first MOS field effect transistor and a second MOS field effect transistor having a current path connected at one end to the gate electrode of the first MOS field effect transistor, the memory device comprising:

• a semiconductor substrate of a first conductivity type forming the channel of either of the first MOS field effect transistor or the second MOS field effect transistor of each memory cell;
• a plurality of first polycrystalline semiconductor layers formed on said semiconductor substrate;
• a plurality of oxide layers singly interposed between said plurality of first polycrystalline semiconductor layers and said semiconductor substrate, each of said plurality of first polycrystalline semiconductor layers forming the channel of the other of the first MOS field effect transistor and the second MOS field effect transistor of a different one of the memory cells;
• a plurality of first semiconductor regions of a second conductivity type formed in the surface region of said semiconductor substrate such that one end portion of each of said plurality of first semiconductor regions is disposed below the central portion of a different one of each of said plurality of first polycrystalline semiconductor layers;
• a plurality of second polycrystalline semiconductor regions formed on said semiconductor substrate;
• and
• a second plurality of oxide layers singly disposed between one end portion of each of said plurality of second polycrystalline semiconductor regions and a central portion of a corresponding one of said plurality of first semiconductor regions, both end portions of each of said plurality of first polycrystalline semiconductor layers being optionally used as the drain and source regions of a corresponding one of the first MOS field effect transistors, said one end portion of each of said plurality of first semiconductor regions forming the gate region of said corresponding one of the first MOS field effect transistors, the other end portion of each of said plurality of first semiconductor regions forming a source and drain region of a corresponding one of said second MOS field effect transistors, one of said plurality of second polycrystalline semiconductor layers being interposed between corresponding ones of said plurality of first semiconductor regions and said second MOS field effect transistors, each of said plurality of second polycrystalline semiconductor layers forming the gate region of said corresponding one of said second MOS field effect transistors.

A semiconductor memory device including a plurality of matrix-arranged memory cells, each of the memory cells including a first MOS field effect transistor and a second MOS field effect transistor having a current path connected at one end to the gate electrode of the corresponding first MOS field effect transistor, the memory device comprising:

• a semiconductor substrate of a first conductivity type forming the channel of either of the first MOS field effect transistor or the second MOS field effect transistor of each of the memory cells;
• a plurality of first polycrystalline semiconductor layers formed on said semiconductor substrate;
• a plurality of oxide layers singly interposed between corresponding ones of said first polycrystalline semiconductor layers and said semiconductor substrate, each of said first polycrystalline semiconductor layers forming the channel of the other of the first MOS field effect transistor and the second MOS field effect transistor of a respective one of the memory cells;
• a plurality of first semiconductor regions of a second conductivity type formed on the surface region of said semiconductor substrate such that each of said first semiconductor regions is positioned below one end portion of a respective one of said first polycrystalline semiconductor layers;
• a plurality of second and third semiconductor regions formed in the surface region of said semiconductor substrate on opposite sides of the other end portion of respective first polycrystalline semiconductor layers, said plurality of second and third semiconductor regions being optionally used as the drain and source regions of respective first MOS field effect transistors, said other end of each of said plurality of first polycrystalline semiconductor layers being used as the gate region of respective ones of the first MOS field effect transistors, said one end portion of each of said plurality of first polycrystalline semiconductor layers optionally forming the source and drain regions of each of a respective one of the second MOS field effect transistors, the first semiconductor region being interposed between said first polycrystalline semiconductor layer and the corresponding second MOS field effect transistor, the plurality of first semiconductor regions constituting the gate regions of respective second MOS field effect transistors;
• a plurality of read word lines, each of said read word lines being connected to the source regions of each of the first MOS field effect transistors of a respective column;
• a plurality of read bit lines, each of said read bit lines being connected to the drain regions of each of the first MOS field effect transistors of a respective row;
• a plurality of write word lines, each of said write word lines being connected to the gate regions of each of the second MOS field effect transistors of a respective column;
• and
• a plurality of write bit lines, each of said write bit lines being connected to the drain regions of each of the second MOS field effect transistors of a respective row.

A semiconductor memory device including a plurality of matrix-arranged memory cells, each of the memory cells including a first MOS field effect transistor and a second MOS field effect transistor having a current path connected at one end to the gate electrode of the corresponding first MOS field effect transistor, the memory device comprising:

• a semiconductor substrate of a first conductivity type forming the channel of either of the first MOS field effect transistor or the second MOS field effect transistor of each of the memory cells;
• a plurality of first polycrystalline semiconductor layers formed on said semiconductor substrate;
• a plurality of oxide layers singly interposed between corresponding ones of said first polycrystalline semiconductor layers and said semiconductor substrate, each of said first polycrystalline semiconductor layers forming the channel of a respective one of the other of the first MOS field effect transistor or the second MOS field effect transistor of a respective one of the memory cells;
• a plurality of first semiconductor regions of a second conductivity type formed on the surface region of said semiconductor substrate such that each said first semiconductor region is positioned below one end portion of a respective one of said first polycrystalline semiconductor layers;
• a plurality of second and third semiconductor regions formed in the surface of said semiconductor substrate on opposite sides of the other end portion of respective ones of said first polycrystalline semiconductor layers, said plurality of second and third semiconductor regions being optionally used as the drain and source regions of respective first MOS field effect transistors, said other end of each of said plurality of first polycrystalline semiconductor layers being used as the gate region of a respective one of the first MOS field effect transistors, said one end portion of each of said plurality of first polycrystalline semiconductor layers optionally forming the source and drain regions of a respective one of the second MOS field effect transistors, each of the first semiconductor region being interposed between a respective one of said first polycrystalline semiconductor layers and a corresponding second MOS field effect transistor, the plurality of first semiconductor regions constituting the gate regions of respective second MOS field effect transistors;
• a plurality of read word lines, each of said read word lines being connected to the source regions of each of the first MOS field effect transistors of a respective column;
• a plurality of write word lines, each of said write word lines being connected to the gate regions of each of the second MOS field effect transistors of a respective column;
• and
• a plurality of bit lines, each of said bit lines being connected to the drain regions of each of the first MOS field effect transistors and the second MOS field effect transistors of a respective row.