Compensated amorphous silicon solar cell
AssigneeChevron Research Company
InventorArun Madan
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Abstract
A hydrogenated amorphous silicon solar cell incorporating a compensated photoactive intrinsic region containing N-type and P-type dopants.
Claims15
In a hydrogenated amorphous silicon solar cell which comprises an electrically conductive substrate, a layer of hydrogenated amorphous silicon having regions of differing conductivity with at least one region of photoactive intrinsic hydrogenated amorphous silicon, said layer of hydrogenated amorphous silicon having opposed first and second major surfaces where said first major surface contacts said electrically conductive substrate, and means for electrically contacting said second major surface, the improvement wherein the photoactive intrinsic hydrogenated amorphous silicon region is compensated with suitable N-type and P-type dopants to reduce the bandgap energy of the material to less than about 1.6 eV, said doping concentration adjusted such that the recombination lifetime of the photoactive intrinsic region is greater than the transit time for the holes and electrons generated in said photoactive intrinsic region out of said region during illumination of the solar cell.
A method of reducing the bandgap energy of a photoactive intrinsic hydrogenated amorphous silicon region incorporated into a hydrogenated amorphous silicon solar cell, said method comprising:
- incorporating a suitable P-type and N-type dopants during the growth of said layer in amounts sufficient to reduce the bandgap energy of the photoactive intrinsic hydrogenated amorphous silicon region to less than about 1.6 eV, said concentrations of said N-type and P-type dopants also being sufficient to fabricate a photoactive intrinsic region wherein the recombination lifetime is greater than the transit time of holes and electrons out of said photoactive region during illumination.
Dependencies are inferred from the claim text.