Cation exchange membrane and process for producing the same
AssigneesJapan Atomic Energy Research Institute, Chlorine Engineers Corp., Ltd.
InventorsIsao Ishigaki, Jiro Okamoto, Hiroyuki Harada
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Abstract
A uniform cation exchange membrane having a certain fluorovinyl sulfonic acid monomer grafted onto a certain high-molecular substrate film which exhibits small electrical resistance and great physical strength is herein disclosed.
Claims18
A cation exchange membrane having a fluorovinyl sulfonic acid monomer grafted onto a high-molecular substrate film having a monomer of the formula:
- ##STR4## (wherein X is hydrogen, fluorine or CH.sub.3, and Y is hydrogen or fluorine) as a monomer unit.
A process for producing a cation exchange membrane wherein a high-molecular substrate film having a monomer of the formula:
- CH.sub.2 .dbd.CXY (wherein X is hydrogen, fluorine or CH.sub.3 ;
- and Y is hydrogen or fluorine) as a monomer unit is exposed to ionizing radiation, and then the substrate film is brought into contact with a solution of a fluorovinyl sulfonic acid monomer so as to graft the fluorovinyl sulfonic acid monomer onto the substrate film.
A process for producing a cation exchange membrane wherein a high-molecular substrate film having a monomer of the formula:
- CH.sub.2 .dbd.CXY (wherein X is hydrogen, fluorine or CH.sub.3 ;
- and Y is hydrogen or fluorine) as a monomer unit is brought into contact with a solution of a fluorovinyl sulfonic acid monomer, and then the mixture is exposed to ionizing radiation to give a total dose of 0.5 to 20 Mrad so as to graft the fluorovinyl sulfonic acid monomer onto the substrate film.
A process for producing a cation exchange membrane wherein a high-molecular substrate film having a monomer of the formula:
- CH.sub.2 .dbd.CXY (wherein X is hydrogen, fluorine or CH.sub.3 ;
- Y is hydrogen or fluorine) as a monomer unit is exposed to ionizing radiation to give a total dose of 0.5 to 20 Mrad, the substrate film is then brought into contact with a solution of a fluorovinyl sulfonic acid monomer, and the substrate film is further exposed to ionizing radiation to give a total dose of 0.5 to 20 Mrad so as to graft the fluorovinyl sulfonic acid monomer onto the substrate film.
Dependencies are inferred from the claim text.