Back to results
US 4,395,537 AGranted
Polyether resin and method of manufacturing the same
AssigneeKanegafuchi Kagaku Kogyo Kabushiki Kaisha
InventorsKazuya Yonezawa, Masahiro Asada, Miyuki Matsuura
Life of this patent
Estimating the term…
Abstract
A polyether of the general formula: ##STR1## in which Ar stands for a divalent organic group of the aromatic series, R stands for CH.sub.3, CH.sub.3 CH.sub.2, Cl or Br, and n is an integer of 0 to 4. It contains at least 1 mol % of unit `B`. A method of manufacturing such a polyether is also disclosed.
Claims9
A polyether comprising recurring units of the general formula:
- ##STR9## in which Ar stands for a divalent organic group of the aromatic series, R stands for a group selected from the group consisting of CH.sub.3, CH.sub.3 CH.sub.2, Cl and Br, and n is an integer of 0 to 4, said polyether containing at least 1 mol % of said unit `B`.
A method of manufacturing a polymer having recurring units of the general formula:
- ##STR14## in which Ar stands for a bivalent organic group of the aromatic series, R stands for a group selected from the group consisting of CH.sub.3, CH.sub.3 CH.sub.2, Cl and Br, and n is an integer of 0 to 4, said polymer containing at least 1 mol % of said unit `B`, said method comprising reacting an alkali metal salt of a difunctional phenol represented by the general formula MO--Ar--OM', in which M and M' each stand for an alkali metal, and Ar stands for a divalent aromatic group, with a mixture of xylylene and methylene dihalides.
Dependencies are inferred from the claim text.