Selective etching of phosphosilicate glass
AssigneeRCA Corporation
InventorsWerner Kern, George L. Schnable
Life of this patent
Estimating the term…
Abstract
A selective chemical etchant solution for phosphosilicate glass includes a carboxylic acid, hydrogen fluoride and water. The invention is also a method for preferentially etching the phosphosilicate glass which comprises the step of immersing the glasses in the etchant solution of the invention.
Claims8
An acidic etchant solution for the preferential etching of phosphosilicate glass in the presence of silicon dioxide consisting essentially of at least about 80 weight percent of a carboxylic acid, and between about 1 and 10 weight percent of both hydrogen fluoride and water.
A method of etching phosphosilicate glass at a greater rate than silicon dioxide which comprises the step of immersing said glass in an acidic etchant solution consisting essentially of at least about 80 weight percent of a carboxylic acid and between about 1 and 10 weight percent of both hydrogen fluoride and water.
Dependencies are inferred from the claim text.