Method of manufacturing an optically readable information carrier using deep U.V. radiation
AssigneeU.S. Philips Corporation
InventorsPieter Van Pelt, Gerardus J. M. Lippits
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Abstract
A method of manufacturing an optically readable information carrier in which a substrate 1 which is provided on at least one surface with a material which is sensitive to deep ultraviolet light having a wavelength from 190-300 nm, is exposed to deep ultraviolet light via a contact mask 2 which on one side has a layer 4 of a material which is not permeable to deep ultraviolet light in which an information track 5, 6 has been provided, after which the exposed plate is developed and if desired is provided with a reflection layer.
Claims3
A method of manufacturing an optically readable information carrier in which a substrate plate is provided on one side or on both sides with an optical structure which structure comprises an information track of information areas situated alternatively at a higher and a lower level, characterized in that a substrate plate which is manufactured entirely from polymethylmethacrylate is exposed, according to a lithographic process, to deep ultraviolet light through a mask which is brought into contact with a surface of said substrate plate, said mask comprising a supporting plate which is transparent to deep ultraviolet light, said supporting plate being provided on the side facing the substrate with a layer of material impermeable to deep ultraviolet light, in which layer a pattern is provided corresponding to the optical structure to be provided in the substrate plate and the substrate plate thus exposed through said mask is then treated with a developer capable of disolving the exposed parts of said polymethylmethacrylate thereby dissolving the exposed parts of said polymethylmethylacrylate and forming an information track on said substrate plate.
Dependencies are inferred from the claim text.