Composition for depositing metallic oxide film coatings

A composition to be dissolved in an organic solvent and applied onto a substrate to deposit a metallic oxide film coating on the substrate, said composition consisting essentially of 100 parts of an indium compound represented by the formula

• In(X).sub.l (Y).sub.m
• wherein, for said indium compound X denotes a chelate ring material selected from the group consisting of acetylacetone, methyl or ethyl ester of acetoacetic acid, lactic acid, triethanolamine, and mixtures thereof;
• Y denotes an alkoxide material selected from the group consisting of butyl alcohol, octyl alcohol, octylene glycol, mono-methylether of ethylene glycol, and mixtures thereof;
• l and m are an integer which is 1 or 2 having the relationship of l+m=3;
• said indium compound being one component of the composition, the other component being from 5 to 20 parts of a tin compound represented by the formula
• Sn(X').sub.2 or Sn(Y').sub.m'
• wherein, for said tin compound X' denotes a chelate ring material selected from the group consisting of acetylacetone, methyl acetoacetoate, and mixtures thereof;
• Y' denotes an alkoxide material selected from the group consisting of butyl alcohol, oxtyl alcohol, and mixtures thereof;
• and m' is an integer which is 2 or 4.