Interferometric surface contour measuring arrangement

Abstract

An arrangement for interferometrically recording in a single interferogram a full development of the contour of a symmetrical reflective surface, such as an internal or external cylindrical or conical surface. An optical system projects a light wave onto the reflective surface such that a reflected wave is formed. The reflected wave is interfered with a reference light wave to generate an interference pattern, and only a selected portion of the interference pattern is projected onto a film medium for recording. The reflective surface is scanned with the projected wave by relatively moving the projected wave relative to the surface, and synchronously therewith, the projected interference pattern is moved relative to the recording medium in a manner such that the information recorded on the film medium is a full development of the contour of the reflective surface.

Dependencies are inferred from the claim text.