Photosensitive element containing UV sensitive terpolymers
AssigneeBell Telephone Laboratories, Incorporated
InventorsElsa Reichmanis, Cletus W. Wilkins, Jr.
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Abstract
A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.
Claims10
A photosensitive body comprising a substrate in contact with a photosensitive material comprising an organic polymer characterized in that said polymer is formed from the monomers comprising (1) a methacrylate ester compound represented by the formula ##STR5## where X.sub.1 is an alkyl, (2) a 3-oximino-2-butanone methacrylate based compound represented by the formula ##STR6## where R.sub.1 is chosen from the group consisting of methyl, ethyl, and propyl, R.sub.2 is chosen from the group consisting of methyl, ethyl and propyl or R.sub.1 and R.sub.2 are connected to form a 5 or 6 member ring, and (3) an acrylonitrile based compound represented by the formula ##STR7## where X.sub.2 is CH.sub.3 or Cl.
Dependencies are inferred from the claim text.