Reduction projection aligner system
AssigneeHitachi, Ltd.
InventorsShinji Kuniyoshi, Akihiro Takanashi, Toshiei Kurosaki
Life of this patent
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Abstract
In a reduction projection aligner system wherein a pattern on a reticle is formed directly on a wafer by reducing, projecting and printing it, a positioning pattern on the wafer is optically magnified and projected and then focused onto a focal plane where a slit scans the projected image. The distance from a mechanical origin provided on the supporting body of the system to the positioning pattern on the wafer is then measured on the basis of the movement of the slit, and the reticle is then relatively moved and positioned so as to coincide with the position of the wafer relative to the body of the system, thereby bringing the wafer and the reticle into coincidence.
Claims5
In a reduction projection aligner system wherein a pattern on a reticle is formed directly on a wafer by reducing and projecting the pattern on the wafer through a reduction projection lens;
- the improvement comprising means to optically magnify and project and then focus a positioning pattern provided on the wafer onto a focal plane, means to scan the focal plane with a slit, an origin sensor provided with a mechanical origin on a body of said system for determining the initial position of said slit, means to measure the distance from the mechanical origin to said positioning pattern provided on said wafer on the basis of the extent of movement of said slit necessary to align said slit with said positioning pattern to thereby determine the position of said wafer relative to the body of said system, and means to relatively move and position the reticle so as to cause it to coincide with the position of said wafer on the basis of the measurement by said distance measuring means.
In a reduction projection aligner system wherein a primary pattern on a recticle is formed directly on a wafer having a positioning pattern thereon by reducing, projecting and printing the primary pattern on the wafer, both the reticle and the wafer being adjustably supported on a common supporting body, the improvement comprising optical means to optically magnify and project and then focus the wafer positioning pattern onto a focal plane, means to scan the focal plane with a slit, means to measure the distance from a mechanical origin provided on said supporting body of said system to said positioning pattern on said wafer on the basis of the extent of movement of said slit necessary to align said slit with said positioning pattern, and means to relatively move and position the reticle so as to cause it to coincide with the position of said wafer relative to said body of said system on the basis of the measurement by said distance measuring means.
Dependencies are inferred from the claim text.