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US 4,380,211 AGranted
Vacuum evaporation system for deposition of thin films
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorKoichi Shinohara
Life of this patent
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Abstract
A blower and a dust collector are communicated through valves with an evacuated process chamber in which are disposed one or more sets of a film-substrate holder and an evaporation source in such a way that the blower, the dust collector and the process chamber constitute a closed circuit.
Claims4
A vacuum evaporation system for the deposition of thin films comprising:
- a blower and dust collector in communication through valve means with an evacuated process chamber in which are disposed at least one set of a film substrate holder and an evaporation source whereby the gases in the evacuated process chamber can be filtered while the vacuum is maintained.
A vacuum evaporation system for the deposition of thin films comprising:
- a blower and a dust collector in communication through valve means with an evacuated process chamber in which are disposed at least one set of a film substrate holder and an evaporation source in such a way that said blower, said dust collector and said evacuated process chamber comprise a closed circuit.
Dependencies are inferred from the claim text.