Electron beam sensitive resist of an anhydride copolymer
AssigneeGAF Corporation
InventorsDonald H. Lorenz, Earl P. Williams
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Abstract
This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a mixed half-ester or half amide of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting hydroxyethyl pyrrolidone and hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.
Claims32
A high sensitivity electron beam resist polymer which is the mixed half-ester reaction product of a reaction between an alkyl vinyl ether-maleic anhydride copolymer with a terminally unsaturated alcohol and a compound selected from the group consisting of N-hydroxyalkyl amides and N-aminoalkyl amides.
A high sensitivity electron beam resist polymer comprising the mixed half-ester product of the reaction of an N-hydroxyalkyl amide and a terminally unsaturated alcohol with an alkyl vinyl ether-maleic anhydride copolymer.
A high sensitivity electron beam resist polymer comprising the mixed half-ester product of the reaction of an N-aminoalkyl amide and a terminally unsaturated alcohol with an alkyl vinyl ether-maleic anhydride copolymer.
An information recording material sensitive to ionizing radiation exposure comprising a copolymer of maleic anhydride and a vinyl monomer, the maleic anhydride being reacted with a mixture of terminally unsaturated alcohol compound and an N-hydroxyalkyl amide.
An information recording material sensitive to ionizing radiation exposure comprising a copolymer of maleic anhydride and a vinyl monomer, the maleic anhydride being reacted with a mixture of terminally unsaturated alcohol compound and an N-aminoalkyl amide.
Dependencies are inferred from the claim text.