Positive-working resist quinone diazide containing composition and imaging method having improved development rates
AssigneeEastman Kodak Company
InventorsRobert C Daly, John R. Guild
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Abstract
There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.
Claims7
In a positive-working composition sensitive to light or electron beams comprising in admixture a 1,2-quinone diazide condensation product and a sensitivity-enhancing agent;
- the improvement wherein said sensitivity-enhancing agent is a heterocyclic compound having one, two or three rings, the nuclear atoms of which consist of carbon atoms and from 2 to 4 nitrogen atoms, at least one of the nitrogen atoms being bonded to hydrogen, said compound having at least two halogen substituents bonded to said nuclear carbon atoms.
In a positive-working resist composition sensitive to light or electron beams comprising, in admixture, a 1,2-quinone diazide sulfonic acid condensation product and a sensitivity-enhancing agent;
- the improvement wherein said sensitivity-enhancing agent comprises ##STR5## wherein n is a number from 2 to 4.
In a method of forming a resist image by imagewise exposing to light or electron beams a resist composition comprising in admixture, a 1,2-quinone diazide condensation product and a sensitivity-enhancing agent, and developing the resist image by completely removing the exposed portions,
- the improvement wherein the developability of said resist is increased by means of a sensitivity-enhancing agent which comprises a heterocyclic compound having one, two or three rings, the nuclear atoms of which consist of carbon atoms and from 2 to 4 nitrogen atoms at least one of which is bonded to hydrogen, and at least two halogen substituents appended from said nuclear carbon atoms.
Dependencies are inferred from the claim text.