Photomask-forming photographic material and method for producing photomask using same
AssigneeFuji Photo Film Co., Ltd.
InventorMasamichi Sato
Life of this patent
Estimating the term…
Abstract
A photomask-forming photographic material which comprises a transparent support having a masking layer thereon, the masking layer having thereon at least one silver halide emulsion layer either directly or on at least one subbing layer on the masking layer.
Claims2
A photomask-forming photographic material which consists of a transparent support which has thereon (1) an etchable masking layer, (2) a subbing layer comprising a thin layer of polyvinyl acetate located directly on the masking layer, and (3) a silver halide emulsion layer located directly on the subbing layer and said masking layer comprises a layer of a metal, a metal oxide, a semi-metal or a chalcogen glass having a thickness ranging from 0.05 to 3 microns and not transmitting ultraviolet light and the subbing layer being by definition a layer the sole function of which is to ultimately adhere the silver halide emulsion layer to the masking layer.
Dependencies are inferred from the claim text.