Photoresist composition
AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsYoichi Kamoshida, Toshiaki Yoshihara, Yoshiyuki Harita, Kunihiro Harada
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Abstract
By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene polymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution and only a small number of pinholes can be obtained even when a base board having a surface of a high reflectance is used.
Claims17
A photoresist composition comprising a cyclized product of a conjugated diene polymer or copolymer, a photo-crosslinking agent soluble in an organic solvent and at least one member selected from the group consisting of compounds represented by the formulas:
- ##STR9## compounds represented by the formulas:
- ##STR10## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, which may be identical or different, represent substituents selected from the group consisting of hydrogen atom and alkyl groups, compounds represented by the formula:
- Ar--N.dbd.N--NH--Ar'
- wherein Ar and Ar', which may be identical or different, represent aromatic groups, and compounds represented by the formulas:
- ##STR11## wherein R.sub.7, R.sub.8, R.sub.9, R.sub.10, R.sub.12 and R.sub.13, which may be identical or different, represent substituents selected from the group consisting of hydrogen atom, alkyl groups, alkenyl groups, aryl groups, and aralkyl groups;
- R.sub.11 represents a substituent selected from the group consisting of hydrogen atom and aryl groups;
- and R.sub.14 represents a substituent selected from the group consisting of hydrogen atom and amino group.
Dependencies are inferred from the claim text.