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US 4,344,383 AGranted
Retainer ring for securing substrates in a vacuum deposition system
AssigneeRCA Corporation
InventorWalter W. Salt, Jr.
Life of this patent
Estimating the term…
Abstract
A novel wafer retainer assembly is described which includes a ring member for securing wafers in a planetary fixture. The ring member is easily removed or inserted by means of thumb and forefinger pressure exerted on tabs extending from open ends of a resilient spring and maintains the wafers in apertures on the planet member without exerting any pressure on the wafers, thus avoiding breakage.
Claims1
An assembly for securing a wafer in an aperture of a planet member wherein the planet member is arranged for rolling and orbiting motion about a vacuum deposition system axis, comprising:
- a circular bearing wall;
- a support surface affixed to one end of the bearing wall for supporting the wafer, the bearing wall and support surface mounted in the planet member to define an outwardly tapered aperture therein, the diameter of the bearing wall at the one end thereof being larger than the diameter at the opposite end;
- a substantially flat, resilient member arranged as an open-ended annulus, the annulus having an outer side wall of a given diameter greater than the diameter of the bearing wall at the one end thereof;
- a beveled surface between the top surface and the outer side wall of the annulus;
- and
- engaging means affixed to each end of the annulus for engaging and applying compressive forces to the annulus and for inserting the annulus into the aperture, whereby when the annulus is inserted in the aperture and the compressive forces released, the annulus expands to position the beveled surface thereof in parallel coplementary mating engagement with the bearing wall of the aperture and the annulus is forced in a direction toward the support surface.
3 more elements
Dependencies are inferred from the claim text.