Cathode sputtering apparatus

In cathode sputtering apparatus for depositing a coating on the surface of an article, including means defining a vacuum chamber, first and second spaced apart sacrificial cathode means disposed in said vacuum chamber defining a sputtering zone therebetween, anode means spaced from said cathode means and disposed in said vacuum chamber, means for discharging electrons into said sputtering zone, article support means for supporting the article to be coated within said sputtering zone and for permitting rotation of the article about an axis, and electrical potential generating means interconnected to said support means for passing an electric current through said support means to the article to be coated, the improvement comprising:

• said article support means being disposed within said vacuum chamber and including electrically conductive support plate means, an electrically conductive shaft having an axis, and shaft bearing means comprising a plurality of bearings at least one of which is an electrically conductive non-lubricated thrust bearing, said shaft including article attachment means for securing the article to be coated to said shaft, wherein said shaft passes through, is supported by, and is in contact with said plurality of bearings for rotation about said shaft axis, and said thrust bearing is supported by and is in electrical contact with said support plate means, and wherein said thrust bearing includes a fixed race, a rotating race, and rolling elements disposed between said races, said races and elements each having an electrical resistivity of less than 6.0 microohms-cm, a surface harness of at least 190 Brinell, and a melting point of at least 2000.degree. C.