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US 4,307,178 AGranted
Plasma develoment of resists
AssigneeInternational Business Machines Corporation
InventorsLeon H. Kaplan, Steven M. Zimmerman
Life of this patent
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Abstract
Exposed patterns in phenol-formaldehyde Novolak resin/diazo ketone resist layers are developed in an oxygen plasma by treating the resist layers, prior to development, with a magnesium salt. This produces a negative pattern. Positive patterns are produced by combining the process with decarboxylation of the exposed areas followed by blanket exposure.
Claims11
A process for producing a patterned resist image on a substrate comprising the steps of:
- coating a layer of a phenol-formaldehyde/diazoketone resist material on said substrate;
- patternwise exposing said layer to radiation;
- reacting said resist layer with magnesium ions, and
- contacting the layer with an oxygen containing plasma so as to preferentially remove portions of said layer.
1 more element
Dependencies are inferred from the claim text.