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US 4,307,177 AGranted
Method of using polymerizable compositions containing onium salts
AssigneeGeneral Electric Company
InventorJames V. Crivello
Life of this patent
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Abstract
Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic halonium salts. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.
Claims4
A substrate coated with an irradiation cured polymerizable composition consisting essentially of by weight
- (A) a monomeric or prepolymeric cationically polymerizable organic material free of oxirane oxygen selected from vinyl organic monomers, vinyl organic prepolymers, cyclic organic ethers, cyclic organic esters, cyclic organic sulfides, cyclic amines and oganosilicon cyclics, and
- (B) 0.1% to 15% of a radiation sensitive aromatic halonium salt having the formula,
- [(R).sub.a (R.sup.1).sub.b X].sub.c /.sup.+[MQ.sub.d ].sup.(d-e)
- capable effecting the polymerization of (A) by exposure to such radiation polymerizable composition to radiant energy,
- where R is a monovalent aromatic organic radical, R.sup.1 is a divalent aromatic organic radical, X is a halogen cation, M is a metal or metalloid atom, Q is a halogen atom, a is a whole number equal to 0 to 2, b is a whole number equal to 0 or 1, and the sum of a+b is equal to 2, c=d-e, e is equal to the valence of M and is an integer equal to 2-7 inclusive, and d is an integer having a value greater than e.
2 more elements
A method which comprises
- (1) mixing a cationically polymerizable organic material free of oxirane oxygen with 0.1% to 15% by weight of cationically polymerizable organic material of a radiation sensitive halonium salt capable of effecting the cure of such cationically polymerizable organic material upon exposure to radiant energy
- (2) exposing the mixture of (1) to ultraviolet radiation, where the radiation sensitive halonium salt has the formula,
- [(R).sub.a (R.sup.1).sub.b X].sub.c /.sup.+ [MQ.sub.d ].sup.(d-e)
- where R is a monovalent aromatic organic radical, R.sup.1 is a divalent aromatic organic radical, X is a halogen cation, M is a metal or metalloid atom, Q is a halogen atom, a is a whole number equal to 0 to 2, b is a whole number equal to 0 or 1, and the sum of a+b is equal to 2, c=d-e, e is equal to the valence of M and is an integer equal to 2-7 inclusive, and d is an integer having a value greater than e.
1 more element
Dependencies are inferred from the claim text.