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US 4,306,011 AGranted
Photosensitive composite and photosensitive lithographic printing plate
AssigneeKonishiroku Photo Industry Co., Ltd.
InventorsMasafumi Uehara, Akio Iwaki, Yoko Ogawa, Fumio Shimada, Masatoshi Matsuzaki
Life of this patent
Estimating the term…
Abstract
A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonyl chloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as 2-methyl resorcinol with an aldehyde or ketone.
Claims9
Photosensitive composition containing a condensation product of sulfonylchloride of o-benzoquinonediazide or o-naphthoquinonediazide and a polyhydric phenol resin shown in the following general formula:
- General formula ##STR2## where, R.sub.1 is an alkyl group having 1 to 8 carbon atoms, R.sub.2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group (whose number of carbon are 1-4 individually), R.sub.3 and R.sub.4 are individually a hydrogen atom or a lower alkyl group (number of carbon:
- 1-4) or a phenyl group, and n is an integer of 3 or more.
Dependencies are inferred from the claim text.