Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
AssigneeKonishiroku Photo Industry Co., Ltd.
InventorsMasafumi Uehara, Akio Iwaki, Yoko Ogawa, Fumio Shimada, Masatoshi Matsuzaki
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Abstract
A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonylchloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as resorcinol with a benzaldehyde, an acetophenone, or a benzophenone.
Claims7
Photosensitive composition containing a condensation product of sulfonylchloride of o-benzoquinonediazide or o-naphthoquinonediazide and a polyhydric phenol resin shown in the following general formula. ##STR2## wherein R.sub.1 is hydrogen or hydroxyl group;
- R.sub.2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group each having 1-4 carbon atoms;
- R.sub.3 is a hydrogen, a lower alkyl group having 1-4 carbon atoms, an aryl group, or a substituted aryl group;
- and R.sub.4 is a hydrogen or halogen atom or an alkyl, alkoxy or nitro group;
- and n is an integer of 3 or more.
Photosensitive composition containing a condensation product of sulfonylchloride of o-naphthoquinonediazide and a polyhyric phenol resin shown in the following general formula. ##STR3## where R.sub.1 is hydrogen or hydroxyl group;
- R.sub.2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group each having 1-4 carbon atoms;
- R.sub.3 is a hydrogen, a lower alkyl group having 1-4 carbon atoms, an aryl group or a substituted aryl group;
- and R.sub.4 is a hydrogen or halogen atom or an alkyl or alkoxy group, each having 1-4 carbon atoms, or a nitro group;
- and n is an integer of 3 or more.
Dependencies are inferred from the claim text.