Novel stripping composition for positive photoresists and method of using same
AssigneeShipley Company, L.L.C.
InventorsRobert L. Martin, George A. Gibson
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Abstract
A novel stripping composition and method of using same is disclosed, which stripping composition comprises: (a) a solvent comprising one or more compounds of formula (I) ##STR1## wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid. The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluenesulfonic acid in dimethyl sulfoxide.
Claims12
A novel stripping composition for stripping positive working photoresist from a substrate, comprising:
- (a) a solvent comprising one or more compounds of formula (I) ##STR5## wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms;
- and
- (b) a suitable organosulfonic acid.
A method of stripping a positive working photoresist from a substrate comprising contacting said resist with a stripping composition comprising:
- (a) a solvent comprising one or more compounds of formula (I) ##STR7## wherein R and R" are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms;
- and
- (b) a suitable organosulfonic acid.
Dependencies are inferred from the claim text.