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US 4,289,573 AGranted
Process for forming microcircuits
AssigneeInternational Business Machines Corporation
InventorsJames Economy, James R. Lyerla, Lester A. Pederson
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Abstract
The resistance of a resist of plasma etching is enhanced by first cross-linking the resist and then contacting it with an aqueous solution of NaOH or KOH. The process is useful to form microcircuits having increased density of geometry.
Claims4
The process for forming a microcircuit comprising the steps of:
- (1) forming on a substrate a resist film of resin containing hydrogen replaceable by reaction with NaOH or KOH;
- (2) subjecting said resist film to lithographic processing;
- (3) cross-linking said resist film;
- (4) contacting the surface of said resist film with an aqueous solution of NaOH or KOH;
- and
- (5) exposing said resist film to plasma etching.
3 more elements
Dependencies are inferred from the claim text.