Method for the preparation of relief structures by phototechniques
AssigneeSiemens Aktiengesellschaft
InventorsRoland Rubner, Eberhard Kuhn, Hellmut Ahne
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Abstract
The invention relates to a method for making more efficient the preparation of relief structures by phototechniques from mixtures containing olefinically unsaturated polymers and azides as photo initiators. For this purpose, the invention provides the use of aromatic azidomaleinimides as photo initiators. The method according to the invention is suitable particularly for the structuring by phototechniques of insulating materials as well as of semiconductor and conductor materials.
Claims6
In a method for the preparation of relief structures by phototechniques wherein a mixture of (i) a photo-or radiation-reactive olefinically unsaturated polymer and (ii) as a photo-initiator, an azide is applied in the form of a layer or foil to a substrate;
- the layer or foil is exposed or irradiated through a mask;
- and the non-exposed or non-irradiated portions of the layer or foil are removed from the substrate to obtain a relief structure, the improvement comprising utilizing as said photo-initiator an aromatic azidomaleinimide.
Dependencies are inferred from the claim text.