Method of exposing and developing a homopolymer resist
AssigneeRCA Corporation
InventorsRichard J. Himics, Michael Kaplan, Nitin V. Desai
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Abstract
Homopolymers of 1-aza-5-acryloxymethyl-3,7-dioxabicyclo[3.3.0]octane are useful as resists for recording information patterns having high sensitivity and excellent contrast between exposed and unexposed areas.
Claims7
In a method of recording information whereby a resist material is exposed to radiation, said resist material becoming more insoluble in a developer solvent where impinged upon by the radiation and the resist material is developed with the developer solvent so as to remove the soluble portions thereof, the improvement which comprises employing as the resist material a film consisting essentially of a homopolymer of 1-aza-5-acryloxymethyl-3,7-dioxabicyclo[3.3.0]octane.
Dependencies are inferred from the claim text.