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US 4,283,482 AGranted
Dry Lithographic Process
AssigneeNihon Shinku Gijutsu Kabushiki Kaisha
InventorsShuzo Hattori, Shinzo Morita
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Abstract
A plasma-polymerized film formed on the surface of a substrate is found to be suitable for subsequent use in electron-beam lithography and the film exposed to a beam of electrons is then developed to provide it with the predetermined pattern. These steps of plasma polymerization, electron-beam exposure and development can be consecutively carried out in vapor phase within a unified vacuum apparatus.
Claims6
A dry lithographic process comprising the consecutive steps of:
- (i) introducing at least one ethylenically unsaturated monomer compound in the vapor form into a vacuum vessel where said monomer compound is, at least in part, excited in a plasma atmosphere and deposited onto the surface of a substrate located in the vacuum vessel to form a plasma-polymerized film on said substrate,
- (ii) exposing the film thus formed on the substrate to a controlled beam of electrons in conformity to the predetermined pattern to degrade the polymer in the exposed part of the film, and
- (iii) removing the degraded part of the polymer from the film by development in vapor phase etching atmosphere.
Dependencies are inferred from the claim text.