Method for maskless chemical and electrochemical machining
AssigneeInternational Business Machines Corporation
InventorsRobert L. Melcher, Lubomyr T. Romankiw, Robert J. von Gutfeld
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Abstract
A method for high resolution maskless chemical and electrochemical machining is described. Preferential etching results from exposing those regions where machining is sought to an energy beam. Such exposures can increase the ething rate in the case of electrochemical machining by a factor of 10.sup.3 to 10.sup.4. Such enhancement is sufficient to make masking unnecessary.
Claims7
A method of selectively electrochemical machining regions of a surface of a non-photolytically active workpiece comprising the following steps:
- placing the surface to be machined in an electrolyte;
- placing a cathode in electrolyte;
- focusing an energy beam having an intensity of between about 10.sup.2 W/cm.sup.2 and 10.sup.6 W/cm.sup.2 onto the workpiece to locally heat the regions of the surface where preferential machining is sought;
- and establish an electric potential between the workpiece serving as an anode and said cathode.
A method for electrochemical machining a region of a surface of a non-photolytically active workpiece employing an electrolyte and a cathode, the improvement comprising:
- directing a light beam having an intensity of greater than about 10.sup.2 W/cm.sup.2 to heat the region of the surface to be machined to increase the machining rate.
A method for selectively electrochemical machining regions of a surface of a workpiece comprising the following steps:
- placing a cathode in an electrolyte;
- focusing a modulated laser beam having an intensity of between about 10.sup.2 W/cm.sup.2 and 10.sup.6 W/cm.sup.2 onto a workpiece to locally heat the regions of the surface where preferential machining is sought;
- and
- applying an electrical potential between the workpiece which serves as an anode and the cathode, said electrical potential being pulsed in synchronism with said modulated beam.
A method for chemical machining regions of a surface by contacting the surface with an etching solution, the improvement comprising:
- directing a light beam having an intensity of greater than about 10.sup.2 W/cm.sup.2 to heat the region of the surface to be machined to increase the etching rate.
Dependencies are inferred from the claim text.