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US 4,282,825 AGranted
Surface treatment device
AssigneeHitachi, Ltd.
InventorsHiroto Nagatomo, Tetsuya Takagaki, Hisao Seki, Shirou Terasaki, Hitoshi Horimuki
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AssigneeHitachi, Ltd.
InventorsHiroto Nagatomo, Tetsuya Takagaki, Hisao Seki, Shirou Terasaki, Hitoshi Horimuki
Estimating the term…
A surface treatment device capable of carrying out the surface treatment such as washing or etching of plate-like articles such as semiconductor wafers maintaining high degree of reliability, wherein a surface treating liquid is introduced into a ring-like or a conduit-like treating vessel. The plate-like articles to be treated are moved by a conveyor on a conveyor path having a surface in parallel with the surfaces of the plate-like articles against the stream of the treating liquid in a piece-by-piece manner, so that the surfaces of the plate-like articles are treated, whereby the surfaces of the semiconductor wafers can be desirably treated prior to manufacturing the semiconductor products.
A surface treatment device comprising at least one treatment vessel means containing a treatment liqud for treating the surfaces of plate-like articles, means for causing the treatment liquid to flow from one end portion of the treatment vessel to a second end portion of the treatment vessel, and a conveyor means for conveying the plate-like articles in said treatment liquid in a direction opposite to a flow direction of the treatment liquid along a conveyor path which is nearly in parallel with main surfaces of the plate-like articles, wherein the surfaces of said plate-like articles are treated while being conveyed in the treatment liquid in the treatment vessel by said conveyor means.
Dependencies are inferred from the claim text.