Method for dry-etching aluminum and aluminum alloys
AssigneeHitachi, Ltd.
InventorsShinya Iida, Kazuyoshi Ueki, Hideo Komatsu, Tatsumi Mitzutani
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Abstract
A method for dry-etching Al and Al alloys is disclosed, which comprises producing plasma discharges with a mixed gas comprising boron trichloride and freon and/or oxygen incorporated therein and patterning Al or an Al alloy by the produced discharges. In this dry etching method, the etch rate of Al or an Al alloy can be remarkably improved over the etch rate attainable according to the conventional techniques, and the difference of the etch rate between Al or an Al alloy and other material can be remarkably increased.
Claims17
A method for dry-etching aluminum and aluminum alloys which comprises producing plasma discharges with a gas comprising boron trichloride and at least one member selected from the group consisting of a halogenated hydrocarbon selected from the group consisting of CF.sub.4, C.sub.2 F.sub.6, C.sub.3 F.sub.8, C.sub.4 F.sub.8, CHF.sub.3 and CCl.sub.2 F.sub.2 and oxygen and patterning aluminum or an aluminum alloy with ions or radicals generated by said discharges.
A method for dry-etching aluminum and aluminum alloys which comprises producing plasma discharges with a gas comprising boron trichloride and at least one member selected from the group consisting of a halogenated hydrocarbon selected from the group consisting of CF.sub.4, C.sub.2 F.sub.6, C.sub.3 F.sub.8, C.sub.4 F.sub.8, CHF.sub.3 and CCl.sub.2 F.sub.2 and oxygen, patterning aluminum or an aluminum aloy with ions or radicals generated by said discharges, and then, conducting plasma cleaning in said halogenated hydrocarbon, alkali washing and water washing.
Dependencies are inferred from the claim text.