Method of depositing an abrasive layer
AssigneeRCA Corporation
InventorsChih C. Wang, Ronald F. Bates
Life of this patent
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Abstract
In a method for the glow discharge deposition of an amorphous, continuous layer from an organosilane and oxygen where the deposition is interrupted, wherein a glow discharge in oxygen is employed prior to resumption of glow discharge layer deposition.
Claims8
In a method for depositing a thick, amorphous, continuous layer of SiO.sub.x onto a substrate which comprises depositing a series of thin layers by glow discharge of an organosilane and oxygen, interrupting the deposition as required, the improvement which comprises initiating the glow discharge in oxygen after each interruption and prior to a subsequent deposition.
In a method for depositing a thick, amorphous, continuous abrasive layer of SiO.sub.x onto a temperature sensitive substrate which comprises depositing a series of thin layers by glow discharge of an organosilane and oxygen, interrupting the deposition as required to maintain the temperature of the substrate below its degradation temperature, the improvement which comprises initiating the glow discharge in oxygen after each interruption and prior to a subsequent deposition.
Dependencies are inferred from the claim text.