Light-reflection type pattern forming system

A light-reflection type pattern forming system, comprising:

• a light source producing light along a predetermined path;
• a light-reflection substrate having a main surface, said substrate being transparent and having a highly-reflective pattern region made of a material of high light reflection disposed on a selected portion of the main surface thereof, said substrate being disposed on the path of said light source whereby the highly-reflective pattern region is exposed to the light from said light source;
• an object to be exposed, disposed at a distance from the path of said light source and positioned to receive light reflected from said highly-reflective pattern region on the main surface of said substrate;
• and
• means disposed on the opposite side of said substrate from said main surface for reflecting light which passes through said substrate in a direction away from said object.

A method of producing a graphic pattern from a reflection type pattern mask comprising the steps of:

• preparing a reflection type pattern mask including a region of material of high reflectivity and a region of material of poor reflectivity which are exposed on one surface of said mask, whereby a predetermined reflection type pattern is formed by both the regions, both the regions having their respective exposed surfaces which are on the same plane;
• irradiating said one surface of said reflection type pattern mask with light from a light source at a predetermined incident angle;
• and
• receiving at an exposure object position light reflected at a certain reflection angle from said one surface of said reflection type pattern mask.