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US 4,229,514 AGranted
Photosensitive composition
AssigneeKonishiroku Photo Industry Co., Ltd.
InventorsYoshio Kurita, Akio Iwaki
Life of this patent
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Abstract
A composition containing a photosensitive polymer which becomes insoluble by a light exposure and particularly to a highly photosensitive composition which comprises a photosensitive polymer having in the structure as photosensitive groups both an a,B-unsaturated ketone group having a cyano group at the a-position and an azide group.
Claims13
A photosensitive composition containing as active ingredient a polymer which has, in the molecular structure, a structural unit represented by the general formula (I):
- ##STR4## wherein R.sub.1 represents hydrogen, an alkyl group or carboxyl;
- R.sub.2 represents hydrogen, halogen or an alkyl group;
- R.sub.3 represents hydrogen, an alkyl group, an aryl group or an aralkyl group;
- Y and Z individually represent an arylene group;
- X represents a divalent organic group connecting the adjacent nitrogen atom and the aromatic ring carbon atom of Y;
- and n represents 0 or 1, the structural unit of said polymer being present in said polymer in an amount not less than 10 mole percent and said polymer having a molecular weight of from about 2,000 to about 1,000,000.
3 more elements
Dependencies are inferred from the claim text.