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US 4,224,897 AGranted
Methods of depositing materials on substrates
AssigneeUnited Kingdom Atomic Energy Authority
InventorRonald A. Dugdale
Life of this patent
Estimating the term…
Abstract
A vapor deposition process which is carried out in a gaseous environment. The homogeneous nucleation of the vapor species in the gaseous environment is suppressed by heating the gaseous environment.
Claims5
A vapor deposition apparatus for evaporating a material in a gaseous environment and depositing the evaporated material on a substrate, the apparatus comprising,
- (a) an outer enclosure;
- (b) an outer enclosure located within the outer enclosure, the outer enclosure and the inner enclosure each maintaining a gaseous environment therein;
- (c) an inlet for a gas into the inner enclosure;
- (d) a gas outlet from the inner enclosure to discharge into the outer enclosure;
- (e) a gas outlet from the outer enclosure;
- (f) means for supporting a material to be vaporized in the inner enclosure;
- and
- (g) means outside the inner enclosure for generating a beam of charged particles and for selectively directing the beam through the inner enclosure at the material supporting means so as to vaporize the material supported thereby, and periodically directing the beam at the outside of a wall of the inner enclosure so as to heat said wall to a temperature such that, in use of the apparatus, the gas in the inner enclosure, at least in the region between the material to be vaporized and a substrate to be coated with the material, is heated by said heated wall to a temperature high enough to suppress homogeneous nucleation of particles of the vaporized material in the gas in said region.
5 more elements
Dependencies are inferred from the claim text.